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Atomic layer deposition and properties of mixed Ta2O5 ZrO2 films
Názov Atomic layer deposition and properties of mixed Ta2O5 ZrO2 films Autor Kukli K. Spoluautori Kemeli M. Vehkamäki M. Heikkilä M.J. Mizohata K. Kalam K. Ritala M. Leskelä M. Kundrata Ivan SAVELEK - Elektrotechnický ústav SAV Fröhlich Karol 1954 SAVELEK - Elektrotechnický ústav SAV ORCID Zdroj.dok. AIP Advances. Vol. 7 (2017), no. 025001 Jazyk dok. eng - angličtina Druh dok. rozpis článkov z periodík (rbx) Ohlasy JIANG, H. - STEWART, D.A. In ACS APPLIED MATERIALS & INTERFACES. MAY 17 2017, vol. 9, no. 19, p. 16296-16304. LEHNINGER, D. - RAFAJA, D. - WUNSCHE, J. - SCHNEIDER, F. - VON BORANY, J. - HEITMANN, J. In APPLIED PHYSICS LETTERS. JUN 26 2017, vol. 110, no. 26. ALKHAYATT, A.H.O. - HUSSAIN, S.A. - MANDI, E.A. An investigation in to the impact of Ti doping on the structural, optical and sensing properties of spray deposited nanocrystalline ZrO2 thin films. In OPTIK. 2018, vol. 159, p. 305-314. JIANG, S. - YANG, X. - ZHANG, J.H. - LI, X.F. Solution-processed stacked TiO2 and Al2O3 dielectric layers for high mobility thin film transistor. In AIP ADVANCES. AUG 2018, vol. 8, no. 8. LI, Junpeng - WU, Jianzhuo - LIU, Junqing - SUN, Jiaming. Effect of Composition, Interface, and Deposition Sequence on Electrical Properties of Nanolayered Ta2O5-Al2O3 Films Grown on Silicon by Atomic Layer Deposition. In NANOSCALE RESEARCH LETTERS. ISSN 1931-7573, 2019, vol. 14, no., pp. MACKUS, Adriaan J. M. - SCHNEIDER, Joel R. - MACISAAC, Callisto - BAKER, Jon G. - BENT, Stacey F. Synthesis of Doped, Ternary, and Quaternary Materials by Atomic Layer Deposition: A Review. In CHEMISTRY OF MATERIALS. ISSN 0897-4756, 2019, vol. 31, no. 4, pp. 1142-1183. BAEK, Gwangho - YANG, Seungmo - KIM, Taeyoon. Influence of deposition pressure of CuTe electrode on the tantalum oxide-based resistive switching memory. In MICROELECTRONIC ENGINEERING. ISSN 0167-9317, 2019, vol. 215, no., pp. ANDERSON, Erik C. - COLA, Baratunde A. Photon-Assisted Tunneling in Carbon Nanotube Optical Rectennas: Characterization and Modeling. In ACS APPLIED ELECTRONIC MATERIALS. ISSN 2637-6113, 2019, vol. 1, no. 5, pp. 692-700. QIN, Guoxuan - PEI, Zhihui - ZHANG, Yibo - LAN, Kuibo - LI, Quanning - LI, Lingxia - YU, Shihui - CHEN, Xuejiao. Dielectric ceramics/TiO2/single-crystalline silicon nanomembrane heterostructure for high performance flexible thin-film transistors on plastic substrates. In RSC ADVANCES, 2019, vol. 9, no. 60, pp. 35289-35296. BHANU, J.U. - THANGADURAI, P. Surface analysis, gate leakage currents and electrical characteristics of Mn ions incorporated into ZrO2 gate dielectric layer in silicon MOS capacitors. In MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING. ISSN 1369-8001, NOV 15 2020, vol. 119. VITALE, S.A. - HU, W.L. - D'ONOFRIO, R. - SOARES, T. - GEIS, M.W. Interface State Reduction by Plasma-Enhanced Atomic Layer Deposition of Homogeneous Ternary Oxides. In ACS APPLIED MATERIALS & INTERFACES. ISSN 1944-8244, SEP 23 2020, vol. 12, no. 38, p. 43250-43256. MUNESHWAR, Triratna - BARLAGE, Doug - CADIEN, Ken. Stoichiometry controlled homogeneous ternary oxide growth in showerhead atomic layer deposition reactor and application for ZrxHf1-xO2. In JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2021, vol. 39, no. 3, pp. ISSN 0734-2101. Dostupné na: https://doi.org/10.1116/6.0000856. CAI, Chengxuan - WEI, Shengsheng - YIN, Zhipeng - BAI, Jiao - XIE, Weiwei - LI, Yue - QIN, Fuwen - SU, Yan - WANG, Dejun. Oxygen vacancy formation and uniformity of conductive filaments in Si-doped Ta2O5 RRAM. In APPLIED SURFACE SCIENCE, 2021, vol. 560, no., pp. ISSN 0169-4332. Dostupné na: https://doi.org/10.1016/j.apsusc.2021.149960. FEDOROV, Pavel - NAZAROV, Denis - MEDVEDEV, Oleg - KOSHTYAL, Yury - RUMYANTSEV, Aleksander - TOLMACHEV, Vladimir - POPOVICH, Anatoly - MAXIMOV, Maxim Yu. Plasma Enhanced Atomic Layer Deposition of Tantalum (V) Oxide. In COATINGS, 2021, vol. 11, no. 10, pp. Dostupné na: https://doi.org/10.3390/coatings11101206. SOSNOV, E. A. - MALKOV, A. A. - MALYGIN, A. A. Nanotechnology of Molecular Layering in Production of Inorganic and Hybrid Materials for Various Functional Purposes: II. Molecular Layering Technology and Prospects for Its Commercialization and Development in the XXI Century. In RUSSIAN JOURNAL OF APPLIED CHEMISTRY, 2021, vol. 94, no. 9, pp. 1189-1215. ISSN 1070-4272. Dostupné na: https://doi.org/10.1134/S1070427221090020. MALODE, Shweta J. - SHETTI, Nagaraj P. ZrOinf2/inf in biomedical applications. In Metal Oxides for Biomedical and Biosensor Applications, 2021-12-03, pp. 471-501. Dostupné na: https://doi.org/10.1016/B978-0-12-823033-6.00016-8. GURYLEV, V. A review on the development and advancement of Ta2O5 as a promising photocatalyst. In MATERIALS TODAY SUSTAINABILITY. ISSN 2589-2347, JUN 2022, vol. 18. Dostupné na: https://doi.org/10.1016/j.mtsust.2022.100131. PHAM, P.V. - BODEPUDI, S.C. - SHEHZAD, K. - LIU, Y. - XU, Y. - YU, B. - DUAN, X.F. 2D Heterostructures for Ubiquitous Electronics and Optoelectronics: Principles, Opportunities, and Challenges. In CHEMICAL REVIEWS. ISSN 0009-2665, MAR 23 2022, vol. 122, no. 6, p. 6514-6613. Dostupné na: https://doi.org/10.1021/acs.chemrev.1c00735. Keeney, L., Povey, I.M.: Vapor Phase Growth of Metal-Oxide Thin Films and Nanostructures In Tailored Functional Oxide Nanomaterials: From Design to Multi-Purpose Applications. Elsevier 2022. ISBN 978-352782694-0. Al Amin, S.M., Gulshan, F., Zubair, M.A.: Stabilisation of Cubic ZrO2 Thin Films Synthesized by Spray Pyrolysis: Influence of Cu Doping on Structural and Optical Properties In 5th IEEE International Conference on Telecommunications and Photonics, ICTP 2023 - e-Proceedings Singh, E.R., Moirangthem, B., Singh, N.K.: Study on Structural and Optical Properties of Ta2O5 Nanocluster In Springer Proceedings in Materials 25, (2023) pp. 97-102 ISLAM, M.S. - LEE, J.H. - GANGULI, S. - ROY, A.K. Effect of oxygen vacancy and Si doping on the electrical properties of Tasub2/subOsub5/sub in memristor characteristics. In SCIENTIFIC REPORTS. ISSN 2045-2322, OCT 3 2023, vol. 13, no. 1. Dostupné na: https://doi.org/10.1038/s41598-023-43888-z. HAN, C.C. - WANG, T. Tantalum Pentoxide: From Crystal Structures to Applications in Water Splitting. In ENERGY & FUELS. ISSN 0887-0624, AUG 30 2023, vol. 37, no. 18, p. 13624-13644. Dostupné na: https://doi.org/10.1021/acs.energyfuels.3c02295. Kategória ADCA - Vedecké práce v zahraničných karentovaných časopisoch impaktovaných Kategória (od 2022) V3 - Vedecký výstup publikačnej činnosti z časopisu Typ výstupu článok Rok vykazovania 2017 Registrované v WOS Registrované v SCOPUS Registrované v CCC DOI 10.1063/1.4975928 článok
rok CC IF IF Q (best) JCR Av Jour IF Perc SJR SJR Q (best) CiteScore A rok vydania rok metriky IF IF Q (best) SJR SJR Q (best) 2017 2016 1.568 Q3 0.957 Q1
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