Počet záznamov: 1  

Operando diagnostic detection of interfacial oxygen ‘breathing’ of resistive random access memory by bulk-sensitive hard X-ray photoelectron spectroscopy

  1. NázovOperando diagnostic detection of interfacial oxygen ‘breathing’ of resistive random access memory by bulk-sensitive hard X-ray photoelectron spectroscopy
    Autor Niu G.
    Spoluautori Calka P.

    Huang P.

    Sharath S.U.

    Petzold S.

    Gloskovskii A.

    Fröhlich Karol 1954 SAVELEK - Elektrotechnický ústav SAV    ORCID

    Zhao Yunpeng

    Kang J.

    Schubert M.A.

    Bärwolf F.

    Ren W.

    Ye Z.-G.

    Perez E.

    Wenger C.

    Alff L.

    Schroeder T.

    Zdroj.dok. Materials Research Letters. Vol. 7 (2019), p. 117-123
    Jazyk dok.eng - angličtina
    Druh dok.rozpis článkov z periodík (rbx)
    OhlasySHEN, Zongjie - QI, Yanfei - MITROVIC, Ivona Z. - ZHAO, Cezhou - HALL, Steve - YANG, Li - LUO, Tian - HUANG, Yanbo - ZHAO, Chun. Effect of Annealing Temperature for Ni/AlOx/Pt RRAM Devices Fabricated with Solution-Based Dielectric. In MICROMACHINES, 2019, vol. 10, no. 7, pp.
    KIM, Jin-Ju - YOON, So-Jung - KIM, Yeriaron - MOON, Seung-Eon - YOON, Sung-Min. Device Feasibility of Ferroelectric Field-Effect Transistors Using Al-Doped HfO2 Gate Insulator Deposited with H2O Oxygen Precursor during Atomic Layer Deposition Process. In PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2021, vol. 218, no. 10, pp. ISSN 1862-6300. Dostupné na: https://doi.org/10.1002/pssa.202100006.
    GADDAM, Venkateswarlu - DAS, Dipjyoti - JEON, Sanghun. Insertion of HfO2 Seed/Dielectric Layer to the Ferroelectric HZO Films for Heightened Remanent Polarization in MFM Capacitors. In IEEE TRANSACTIONS ON ELECTRON DEVICES, 2020, vol. 67, no. 2, pp. 745-750. ISSN 0018-9383. Dostupné na: https://doi.org/10.1109/TED.2019.2961208.
    DITTMANN, Regina - MENZEL, Stephan - WASER, Rainer. Nanoionic memristive phenomena in metal oxides: the valence change mechanism. In ADVANCES IN PHYSICS, 2021, vol. 70, no. 2, pp. 155-349. ISSN 0001-8732. Dostupné na: https://doi.org/10.1080/00018732.2022.2084006.
    YIN, Yuhao - SHEN, Yang - WANG, Hu - CHEN, Xiao - SHAO, Lin - HUA, Wenyu - WANG, Juan - CUI, Yi. In Situ Growth and Characterization of TiN/HfxZr1-xO2/TiN Ferroelectric Capacitors. In ACTA PHYSICO-CHIMICA SINICA, 2022, vol. 38, no. 5, pp. ISSN 1000-6818. Dostupné na: https://doi.org/10.3866/PKU.WHXB202006016.
    MAHATA, C. - ISMAIL, M. - KIM, D.H. - KIM, S. Quantized synaptic characteristics in HfO2-nanocrystal based resistive switching memory. In JOURNAL OF MATERIALS RESEARCH AND TECHNOLOGY-JMR&T. ISSN 2238-7854, NOV-DEC 2022, vol. 21, p. 981-991. Dostupné na: https://doi.org/10.1016/j.jmrt.2022.09.095.
    GRONENBERG, O. - MARQUARDT, R. - LAMPRECHT, R. - EKICI, Y. - SCHURMANN, U. - KOHLSTEDT, H. - KIENLE, L. The impact of rapid thermal annealing for the ferroelectricity of undoped sputtered HfO2 and its wake-up effect. In JOURNAL OF APPLIED PHYSICS. ISSN 0021-8979, SEP 7 2022, vol. 132, no. 9. Dostupné na: https://doi.org/10.1063/5.0100562.
    LEONETTI, G. - FRETTO, M. - PIRRI, F.C. - DE LEO, N. - VALOV, I. - MILANO, G. Effect of electrode materials on resistive switching behaviour of NbOsubx/sub-based memristive devices. In SCIENTIFIC REPORTS. ISSN 2045-2322, OCT 9 2023, vol. 13, no. 1. Dostupné na: https://doi.org/10.1038/s41598-023-44110-w.
    ISMAIL, M. - RASHEED, M. - MAHATA, C. - KANG, M. - KIM, S. Mimicking biological synapses with a-HfSiOsubx/sub-based memristor: implications for artificial intelligence and memory applications. In NANO CONVERGENCE. ISSN 2196-5404, JUL 10 2023, vol. 10, no. 1. Dostupné na: https://doi.org/10.1186/s40580-023-00380-8.
    ZAHARI, F. - MARQUARDT, R. - KALLAENE, M. - GRONENBERG, O. - SCHLUETER, C. - MATVEYEV, Y. - HABERFEHLNER, G. - DIEKMANN, F. - NIERHAUVE, A. - BUCK, J. - HANFF, A. - KOLHATKAR, G. - KOTHLEITNER, G. - KIENLE, L. - ZIEGLER, M. - CARSTENSEN, J. - ROSSNAGEL, K. - KOHLSTEDT, H. Trap-Assisted Memristive Switching in HfOsub2/sub-Based Devices Studied by In Situ Soft and Hard X-Ray Photoelectron Spectroscopy. In ADVANCED ELECTRONIC MATERIALS. ISSN 2199-160X, JUN 2023, vol. 9, no. 6. Dostupné na: https://doi.org/10.1002/aelm.202201226.
    KategóriaADCA - Vedecké práce v zahraničných karentovaných časopisoch impaktovaných
    Kategória (od 2022)V3 - Vedecký výstup publikačnej činnosti z časopisu
    Typ výstupučlánok
    Rok vykazovania2019
    Registrované vWOS
    Registrované vSCOPUS
    Registrované vCCC
    DOI 10.1080/21663831.2018.1561535
    článok

    článok

    rokCCIFIF Q (best)JCR Av Jour IF PercSJRSJR Q (best)CiteScore
    A
    rok vydaniarok metrikyIFIF Q (best)SJRSJR Q (best)
    201920187.440Q12.627Q1
Počet záznamov: 1  

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